A New Device for Highly Accurate Gas Flow Control With Extremely Fast Response Times
(IBM, Pivotal Systems)

May 18, 2011


Presentation material from the 2011 Advanced Semiconductor Manufacturing Conference (ASMC)
A New Device for Highly Accurate Gas Flow Control With Extremely Fast Response Times
(IBM, Pivotal Systems)

May 18, 2011


White paper published at the 2011 Advanced Semiconductor Manufacturing Conference (ASMC)
Improving Etch Performance Using In Situ Gas Flow Monitoring and Control
(IBM, Pivotal Systems)

August 12, 2010


Technical presentation proceedings from the Plasma Application Group, part of the Northern California Chapter
of the American Vacuum Society
Improving Etch Performance Using In Situ Gas Flow Monitoring and Control
(IBM, Pivotal Systems)

July 11, 2010


Technical article featured in Solid State Technology
Sensor X: In Situ Metrology for Plasma Processing
(Pivotal Systems)

August 21, 2009


Technical presentation proceedings from the Plasma Application Group, part of the Northern California
Chapter of the American Vacuum Society
A New Method for Very Low Open Area End Point Detection (Qimonda, Pivotal Systems)
April 18, 2007


Proceedings presentation from European AEC/APC 2007 conference