The GFC Solution – Innovative Design
GFC combines Pivotal's patented high accuracy GFM™ system with patent-pending high-precision control valve technology. The control valve has an integrated position sensor, which is used to maintain a constant flow rate. A map lookup scheme is employed to adjust the valve position to accommodate for upstream pressure changes. GFC also incorporates GFM, which performs a periodic NIST-traceable flow calibration, to confirm and maintain flow accuracy throughout the device’s lifetime. The fast response time of the sensors and high sampling rate in the control loop enables control of gas flow on the order of tens of milliseconds.

As such, GFC leapfrogs current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer manufacturing processes.