Pivotal Systems provides the best-in-class gas flow monitoring and control technology platform for the global semiconductor industry. The company’s proprietary hardware and software utilizes advanced machine learning to enable preventative diagnostic capability resulting in an order of magnitude increase in fab productivity and capital efficiency for existing and future technology nodes.
The platform includes Pivotal’s Gas Flow Controller (GFC) product lines that offer high-accuracy, real-time monitoring and control of the most critical parameters difficult to control in wafer processing today: Gas Flow and Chamber Condition.
- Pivotal’s Ultra-High Speed GFCs operate at speeds down to ≤ 10msec on/off for process set point response time. This represents a significant speed improvement over other suppliers in the industry. At the same time, Pivotal can guarantee flow accuracy of ±0.5% of set point for the actual gas at these speeds. This leads to improved chamber matching and potential process improvements.
- Pivotal’s new High Flow GFCs flows up to 50 slm. Leading manufacturers are already qualifying the High Flow GFCs into their fabs for the most advanced CVD and ALD processes.
IDMs, foundries and OEMs use Pivotal’s products to dramatically improve yield and productivity by avoiding catastrophic scrap events, tightening process windows and matching chambers more effectively.
To meet strong industry demand, Pivotal Systems now operates high-capacity manufacturing facilities in the United States and Korea, and the company has annually doubled its total unit production each year since 2014.
As process geometries within the semiconductor industry continue to shrink to 10 nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, best-in-class MFCs are struggling to meet the accuracy, settling time and repeatability requirements demanded to ensure high yield and matched chambers.
Pivotal Systems’ GFC paves the way for the future of gas flow control. The GFC combines Pivotal’s patented, high accuracy GFM™ system with patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes.