Gas Flow Controller
GFC X
GFC X5 | GFC X20 | GFC X50
The GFC X, the latest generation in Pivotal’s high-flow product line, features a pressure-based flow controller with a position control valve, allowing for precise control. We offer one of the industry’s widest ranges of accuracy, making it ideal for various applications, including deposition processes. The GFC X paves the way for the future of gas flow control by offering an order of magnitude improvement on key flow metrics and enabling advanced wafer-manufacturing processes. In addition, the GFC X offers a range of accuracy from 5% to 100% of full scale, surpassing many competitors.
Features
- Flow accuracy +/- 1% of Setpoint
- Response time <150ms
- Machine Learning used to update valve positioning
- Open flow path with no small orifices or capillary tubes
Benefits
- Unaffected by variations in pressure – works with downstream pressures from vacuum to atmospheric
- Exceptional corrosive gas performance
- Unparalleled diagnostics available
Specifications
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